† Corresponding author. E-mail:
Project supported by the Major Research Plan of the National Natural Science Foundation of China (Grant No. 91433112), the National Natural Science Foundation of China (Grant No. 51672163), and the Key Laboratory of Functional Crystal Materials and Device (Shandong University, Ministry of Education), China (Grant No. JG1401).
The photoluminescence (PL) and electrical properties of AlGaN/GaN high electron mobility transistors (HEMTs) with different Fe doping concentrations in the GaN buffer layers were studied. It was found that, at low Fe doping concentrations, the introduction of Fe atoms can result in a downward shift of the Fermi level in the GaN buffer layer, since the Fe atoms substitute Ga and introduce an Fe
High electron mobility transistors (HEMTs) based on AlGaN/GaN heterostructures, which contain a polarization-induced high-mobility two-dimensional electron gas (2DEG) at the AlGaN/GaN interfaces, even in the absence of any doping, have been widely studied for their potential application in high-frequency and high-power amplifiers.[1–3] However, AlGaN/GaN heterostructures often show a high buffer leakage current (BLC) due to the high background carrier density in the GaN buffer layer, which may originate from crystalline defects such as vacancies, threading dislocations, and unintentionally incorporated donor impurities such as Si and O.[4,5] Reduction of BLC is extremely important to improve the device performance, and some approaches, such as using C-, Fe-, Cr-, and Mg-doping, have been demonstrated to obtain semi-insulating (SI)-GaN wafers.[6–8] The impurities, as deep acceptors in the form of substitution atoms, can trap electrons, compensating for the donor impurity states in the n-type GaN. Therefore, Fe doping (GaN:Fe) is considered to be one of several promising methods due to its reproducibility and controllability: SI-GaN:Fe substrates and SI-GaN:Fe based transistors have demonstrated high resistivity and high electron mobility, respectively.[9,10] Some articles have discussed the optical or electrical properties of the SI-GaN:Fe bulk films and the SI-GaN:Fe-based HEMTs.[10–14] However, to the best of our knowledge, the investigation of the intrinsic relationship between optical and electrical characteristics in the same SI-GaN:Fe-based HEMT is scarce. Nevertheless, investigating different Fe doping concentrations by optical measurements may be beneficial to understand the variation of the electrical characteristics of the HEMTs due to its simplicity and effectiveness, without the need for full device fabrication.
In this study, three AlGaN/GaN HEMTs with different Fe doping concentrations were grown, and characterised by photoluminescence (PL), Hall-effect, and I–V measurements. The measurement results showed that the PL and electrical properties of AlGaN/GaN HEMTs depended markedly on the concentration of Fe doping into the GaN buffer layer, and an appropriate Fe doping concentration was necessary to obtain high-performance AlGaN/GaN HEMTs.
Three types of AlGaN/GaN heterostructures with different Fe doping concentrations were grown on (0001) sapphire substrates using metal–organic chemical vapor deposition (MOCVD). Each AlGaN/GaN heterostructure consisted of a 40-nm-thick low-temperature AlN nucleation layer, followed by a 1.5-μm-thick GaN buffer layer with different Fe doping concentration, a 0.8-μm-thick unintentionally doped GaN buffer layer, a 1-nm-thick AlN interlayer, and a 20-nm-thick AlGaN barrier layer. The Fe doping concentration in the GaN buffer layer was 0 for sample A (i.e., as grown), 1 × 1019 for sample B (slightly-doped), and 2 × 1020 cm−3 for sample C (heavily-doped). Figure
The PL spectra were excited using the 325 nm line of a He–Cd laser. The PL signals were analyzed by using a Jobin-Yvon iHR320 monochromator equipped with a thermoelectrically cooled Synapse CCD detector. Hall effect measurements were performed in the van der Pauw geometry on 15 mm square samples, using indium dots as Ohmic contacts. Moreover, I–V measurements were performed by using an Agilent B1500A semiconductor parameter analyzer.
Figure
With increasing temperature below about 230 K, the ZPL intensity gradually decreases, while the intensity of all vibrational replicas increases accompanied by their gradual merging. This behavior can be explained as the gradual increase of the electron–phonon interaction with rising temperature.[13] Above about 230 K, the ZPL component vanishes and the PL spectrum transforms into the 1.287 PL band. Based on this, we conclude that at room temperature, the 1.287 eV IR emission is attributed only to all vibrational replicas of the ZPL. This shows that, in the present study, two nominal Fe-doped structures (i.e., samples B and C) have been successfully grown, and the Fe atoms incorporated in the GaN matrix are substitutional on the Ga site and introduce the charge transfer level (
Moreover, it is found from Fig.
However, with a further increase in the Fe doping concentration, corresponding to sample C, the density of O donors incorporated into the GaN buffer layer will also increase, since the O contamination is known to originate from the large flow rate of the Fe source (Cp2Fe).[10,12,18] This results in the increase of the VGa concentration due to the movement of the Fermi level from the mid-gap to CBM, and the increase of the amount of VGa–O complexes due to the incorporation of O donors.[10,12] Both lead to the increase of the YL band intensity for sample C compared with that of sample B. Meanwhile, the upward shift of the Fermi level by the O donor incorporation also causes the charge state of the
To investigate the influence of the Fe doping concentration on the behavior of 2DEG at the AlGaN/GaN interface, the sheet carrier density and Hall mobility of the three samples as a function of temperature from 10 K to 300 K were measured. As shown in Fig.
On the other hand, the electron mobility of all the samples first shows a slight decrease below approximately 70 K, and then a significant decrease with further increase in the test temperature (Fig.
To examine the influence of the Fe doping on BLC in AlGaN/GaN HEMTs, the output drain–source currents (IDS) as a function of drain–source voltage (VDS) for the three samples were measured at different gate–source voltages (VGS), and they demonstrated similar trends in their variations. Figure
Figure
Based on all the experimental results described above, it may be concluded that, compared with the non-doped sample (such as sample A), a lower Fe doping concentration (1 × 1019 cm−3, such as sample B) can result in a downward shift of the Fermi level in the GaN buffer layer due to the introduction of an
Taking into account the above mentioned intrinsic relationship between the PL (YL or/and IR) and BLC characteristics, we find that the study of PL characteristic in AlGaN/GaN HEMTs with different Fe doping GaN buffer layer could be a route to understand the variation of BLC characteristic without the need for full device fabrication. Although more careful experimental investigations are required in future research, the experimental results and the intrinsic relationship between the PL and electrical characteristics obtained in the present work are expected to provide a useful guidance to scientists involved in the fabrication of high-performance AlGaN/GaN HEMTs.
The influence of Fe doping concentration on optical and electrical properties in AlGaN/GaN HEMTs was investigated by PL, Hall-effect, and I–V measurements. The measurement results showed that, compared with the as-grown sample, the slightly doped sample showed a downward shift of the Fermi level in the GaN buffer layer due to the introduction of an
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